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| Plasma Monitoring |
| The Multiband Plasma Monitor is a device for the
real-time monitoring of plasma processes (1024 spectral
channels) in the semiconductor industry by Optical Emission
Spectroscopy (OES). Unlike with other methods, more than a thousand
spectral channels can be observed simultaneously, contributing to
superb sensitivity and selectivity of the measurement. Powerful
hardware, sophisticated data analysis and user-friendly software, we
offer a complete suite of application-oriented problem solutions
covering many applications such as such as etching, sputtering,
cleaning and CVD. Our solutions can be easily embedded into
existing customer production and IT environments.
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Features
- Simultaneous recording of 1024 optical channels
- Spectral range from 200 to 950 nm
- Up to 50 complete
spectra per second
- Robust design, maintenance-free
- Internal data processing / compression and signal extraction
- Direct LAN connection via TCP/IP
- Additional analog
and digital interface ports
- Complete software solutions for
endpoint control, FDC, APC, factory
integration
Applications
- Characterization of plasma processes
- Highly
sensitive etch endpoint control
- Highly selective Automatic
Fault Detection and Control (FDC)
- Advanced Process Control
(APC)
- Tool comparison and matching
- Optimization of
chamber cleaning cycles
- Process diagnostics
- Process optimization
- Endpoint control
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 Datasheet
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