| Part Number |
C7460 |
| Name of product |
Multiband Plasma Process Monitor |
| Brief description |
Multichannel Optical Emission Spectrometer for the semiconductor industry |
|
Full description |
|
The MPM is a multichannel detector system for the Optical Emission Spectroscopy (OES). It allows the monitoring of 1024 spectral channels in real-time. Powerful hardware and software are available for a wide range of applications in those processes where a plasma is involved, such as etching, sputtering, cleaning and CVD. |
|
Features |
- Simultaneous recording of 1024 optical channels
- Spectral range from 200 to 950 nm
- Up to 50 complete spectra per second
- Robust design, maintenance-free
- Internal data processing / compression and signal extraction
- Direct LAN connection via TCP/IP
- Additional analog and digital interface ports
- Complete software solutions for endpoint control, FDC, APC, factory integration
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|
Applications |
- Characterization of plasma processes
- Highly sensitive etch endpoint control
- Highly selective Automatic Fault Detection and Control (FDC)
- Advanced Process Control (APC)
- Tool comparison and matching
- Optimization of chamber cleaning cycles
|
| Standards Compliance |
CE |
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